Module 2: Defect Chemistry
  Defect Structures in Non-Stoichiometric Oxides
 


       2.5.1 Oxygen Deficient Oxides

  • Formation of oxygen vacancies or metal interstitials or both are possible.

  • Formation occurs only at the surface.

       2.5.1.1 If oxygen vacancies are the dominating defects

  • Depicted by MO2-x (x is the extent of non-stoichiometry) and overall reaction as

    MO2⇔MO2-x+ x/2 O2
  • Due to loss of oxygen, possible defect reactions would be

    • Electronic compensation leading to creation oxygen vacancies and of electrons
      O0 VO••+ ½ O2+ 2e'

    • Ionic compensation leads to formation of oxygen vacancies and reduction of metal ions on their sites.

    O0 VO••+ ½ O2+ 2M'M

      2.5.1.2 If metal interstitials are the dominating defects then,
  • Depicted as  (M1+yO2 is the extent of non-stoichiometry)

  • Possible defect reactions are

    • Ionic compensation leading to the formation of metal interstitials and reduction of metal ions on their sites

      MM Mi•••• + 4 M'M
      OR
    • Electronic compensation leading to the formation of metal interstitials and free electrons

    • M Mi••••+ 4e'

  • Creation of quasi-free electrons (extra charge is represented as M’)

  • Conduction occurs due to transport of electrons

  • Typically n-type conductors.

  • Example: TiO2, ZrO2, CeO2, Nb2O5